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Semiconductor-related Products | Nanoimprint Solution

Nanoimprint lithography (NIL) technology is based on the hot embossing lithography, using patterned mold (metal pattern) as a master mask. As nanoimprint lithography is capable of transferring microstructures with low-cost, its application to semiconductors, storage devices, and optical devices is expected.
Toppan is developing various types of master molds, utilizing its minute fabrication technologies developed for photomasks and compact disc stampers.

News Releases

Toppan and SCIVAX enter into capital and business alliances for nanoimprint business

Nanoimprint lithography (NIL)
Nanoimprint lithography

Nanoimprint Solution Service

Toppan offers comprehensive solution service of nanoimprint ranging from optical design and simulation to master mold manufacturing and mass production of end products through the capital and business alliance with SCIVAX Corporation.

Nanoimprint solution service

Standard Nanoimprint Lithography Silicon Molds for Evaluation

We can offer standard mold sample at relatively low price.
Please use it for evaluation.

Specifications Overview

  • Substrate (Si) thickness:725um
  • Pattern area: □ 18mm
  • Chip size: □ 1inch

Standard mold sample : Line-up (Silicon mold)

Pattern

Line & Space

Hole

Pillar

Pitch

200nm

400nm

1000nm

400nm

300nm

400nm

Depth

250nm

270nm

270nm

220nm

260nm

230nm

Top width

140nm

240nm

540nm

240nm

195nm

141nm

Bottom width

110nm

220nm

510nm

210nm

164nm

178nm

Chip size

□1inch

□1inch

□1inch

□1inch

□1inch

□1inch

Chip thickness

725um

725um

725um

725um

725um

725um

Cross-section image of mold pattern

Click here to download "Standard mold sample brochure(PDF:133KB)

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